Hydrogen silsesquioxane (HSQ) is a negative tone electron-beam resist. The Hydrogen silsesquioxane

Silsesquioxane

200px|thumbnail|right|Figure 1: Silsesquioxane Cage StructureA silsesquioxane is a compound with the empirical chemical formula RSiO3/2 where Si is the element silicon, O is oxygen and R is either hydrogen or an alkyl, alkene, aryl, arylene group.These materials can be used as a support for...

monomer is a cubical-shaped molecule having one Si atom at each corner, with corners being linked via oxygen atoms. Additionally, a hydrogen group is attached to each Si. The formula of the HSQ monomer is H₈Si₈O₁₂. Thin HSQ layers have been used to show very high resolution (~10 nm) feature sizes.
It can be cross-linked by exposure to e-beam or EUV radiation with wavelengths shorter than 157 nm.

Reference

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