Magnetolithography
Encyclopedia
Magnetolithography is a method for pattern surfaces. ML based on applying a magnetic field
on the substrate using paramagnetic metal masks named "magnetic mask". Magnetic mask which is analog to photomask
define the spatial distribution and shape of the applied magnetic field. The second component is ferromagnetic nanoparticles (anlog to photoresist
) that are assembled onto the substrate according to the field induced by the magnetic mask.
ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles react chemically or interact via chemical recognition with the substrate. Hence, the magnetic nanoparticles are immobilized at selected locations, where the mask induces a magnetic field, resulting in a patterned substrate. In the negative approach, the magnetic nanoparticles are inert to the substrate. Hence, once they pattern the substrate, they block their binding site on the substrate from reacting with another reacting agent. After the adsorption of the reacting agent, the nanoparticles are removed, resulting in a negatively patterned substrate.
ML is a backside lithography
, which has the advantage of ease in producing multilayer with high accuracy of alignment and with the same efficiency for all layers.
Magnetic field
A magnetic field is a mathematical description of the magnetic influence of electric currents and magnetic materials. The magnetic field at any given point is specified by both a direction and a magnitude ; as such it is a vector field.Technically, a magnetic field is a pseudo vector;...
on the substrate using paramagnetic metal masks named "magnetic mask". Magnetic mask which is analog to photomask
Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography.-Overview:...
define the spatial distribution and shape of the applied magnetic field. The second component is ferromagnetic nanoparticles (anlog to photoresist
Photoresist
A photoresist is a light-sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface.-Tone:Photoresists are classified into two groups: positive resists and negative resists....
) that are assembled onto the substrate according to the field induced by the magnetic mask.
ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles react chemically or interact via chemical recognition with the substrate. Hence, the magnetic nanoparticles are immobilized at selected locations, where the mask induces a magnetic field, resulting in a patterned substrate. In the negative approach, the magnetic nanoparticles are inert to the substrate. Hence, once they pattern the substrate, they block their binding site on the substrate from reacting with another reacting agent. After the adsorption of the reacting agent, the nanoparticles are removed, resulting in a negatively patterned substrate.
ML is a backside lithography
Lithography
Lithography is a method for printing using a stone or a metal plate with a completely smooth surface...
, which has the advantage of ease in producing multilayer with high accuracy of alignment and with the same efficiency for all layers.