Mask data preparation
Encyclopedia
Mask data preparation is the step that translates an intended set of polygons on an integrated circuit layout
into a form that can be physically written by the photomask
writer. Usually this involves fracturing complex polygons into simpler shapes, often rectangles and trapezoids, that can be written by the mask writing hardware. Therefore this step was sometimes called mask fracturing, which is now but a part of the MDP.
Typically a design is delivered to mask data preparation in GDSII
or OASIS
format, and after fracturing is written out in a proprietary format specific to the mask writer.
Although previously a simple translation task, the changes required for resolution enhancement technologies
(RET) and optical proximity correction
(OPC) steps associated with design for manufacturability
considerations can create huge data volume problems for the mask writer, so some care must be applied to mitigate these negative effects.
Integrated circuit layout
Integrated circuit layout, also known IC layout, IC mask layout, or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.When...
into a form that can be physically written by the photomask
Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography.-Overview:...
writer. Usually this involves fracturing complex polygons into simpler shapes, often rectangles and trapezoids, that can be written by the mask writing hardware. Therefore this step was sometimes called mask fracturing, which is now but a part of the MDP.
Typically a design is delivered to mask data preparation in GDSII
GDSII
GDSII stream format, common acronym GDSII, is a database file format which is the de facto industry standard for data exchange of integrated circuit or IC layout artwork. It is a binary file format representing planar geometric shapes, text labels, and other information about the layout in...
or OASIS
Open Artwork System Interchange Standard
OASIS is a language used by computers to represent and express an electronic pattern for an integrated circuit during its design and manufacture. The language defines the code required for geometric shapes such as polygons, rectangles and trapezoids...
format, and after fracturing is written out in a proprietary format specific to the mask writer.
Although previously a simple translation task, the changes required for resolution enhancement technologies
Resolution enhancement technologies
Resolution enhancement technologies are methods used to modify photomasks for integrated circuits to compensate for limitations in the lithographic processes used to manufacture the chips....
(RET) and optical proximity correction
Optical proximity correction
Optical proximity correction is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects...
(OPC) steps associated with design for manufacturability
Design for manufacturability (IC)
Achieving high-yielding designs in the state of the art, VLSI technology has become an extremely challenging task due to the miniaturization as well as the complexity of leading-edge products...
considerations can create huge data volume problems for the mask writer, so some care must be applied to mitigate these negative effects.