SiGe
Encyclopedia
SiGe or silicon-germanium, is a general term for the alloy
Si1−xGex which consists of any molar ratio of silicon
and germanium
. It is commonly used as a semiconductor material in integrated circuit
s (ICs) for heterojunction
bipolar transistors or as a strain
-inducing layer for CMOS
transistors. This relatively new technology offers opportunities in mixed-signal circuit
and analog circuit IC design and manufacture.
fellow.
SiGe is manufactured on silicon wafers using conventional silicon processing
toolsets. SiGe processes achieve costs similar to those of silicon CMOS manufacturing and are lower than those of other heterojunction technologies such as gallium arsenide. Recently, organogermanium precursors (e.g. isobutylgermane, alkylgermanium trichlorides, and dimethylaminogermanium trichloride) have been examined as less hazardous liquid alternatives to germane for MOVPE deposition of Ge-containing films such as high purity Ge, SiGe, and strained silicon
.
SiGe foundry
services are offered by several semiconductor technology companies. AMD disclosed a joint development with IBM for a SiGe stressed-silicon technology, targeting the 65-nm process. TSMC also sells SiGe manufacturing capacity.
s, making it suitable for mixed-signal circuits. Heterojunction bipolar transistors have higher forward gain and lower reverse gain than traditional homojunction bipolar transistor
s. This translates into better low current and high frequency performance. Being a heterojunction technology with an adjustable band gap
, the SiGe offers the opportunity for more flexible band gap tuning
than silicon-only technology.
Silicon Germanium-on-insulator (SGOI) is a technology analogous to the Silicon-On-Insulator (SOI)
technology currently employed in computer chips. SGOI increases the speed of the transistor
s inside microchips by straining the crystal lattice
under the MOS transistor
gate, resulting in improved electron mobility
and higher drive currents. SiGe MOSFETs can also provide lower junction leakage due to the lower band gap value of SiGe.
Alloy
An alloy is a mixture or metallic solid solution composed of two or more elements. Complete solid solution alloys give single solid phase microstructure, while partial solutions give two or more phases that may or may not be homogeneous in distribution, depending on thermal history...
Si1−xGex which consists of any molar ratio of silicon
Silicon
Silicon is a chemical element with the symbol Si and atomic number 14. A tetravalent metalloid, it is less reactive than its chemical analog carbon, the nonmetal directly above it in the periodic table, but more reactive than germanium, the metalloid directly below it in the table...
and germanium
Germanium
Germanium is a chemical element with the symbol Ge and atomic number 32. It is a lustrous, hard, grayish-white metalloid in the carbon group, chemically similar to its group neighbors tin and silicon. The isolated element is a semiconductor, with an appearance most similar to elemental silicon....
. It is commonly used as a semiconductor material in integrated circuit
Integrated circuit
An integrated circuit or monolithic integrated circuit is an electronic circuit manufactured by the patterned diffusion of trace elements into the surface of a thin substrate of semiconductor material...
s (ICs) for heterojunction
Heterojunction
A heterojunction is the interface that occurs between two layers or regions of dissimilar crystalline semiconductors. These semiconducting materials have unequal band gaps as opposed to a homojunction...
bipolar transistors or as a strain
Strain (materials science)
In continuum mechanics, the infinitesimal strain theory, sometimes called small deformation theory, small displacement theory, or small displacement-gradient theory, deals with infinitesimal deformations of a continuum body...
-inducing layer for CMOS
CMOS
Complementary metal–oxide–semiconductor is a technology for constructing integrated circuits. CMOS technology is used in microprocessors, microcontrollers, static RAM, and other digital logic circuits...
transistors. This relatively new technology offers opportunities in mixed-signal circuit
Mixed-signal integrated circuit
A mixed-signal integrated circuit is any integrated circuit that has both analog circuits and digital circuits on a single semiconductor die.- Examples :...
and analog circuit IC design and manufacture.
Production
The use of silicon-germanium as a semiconductor was championed by Bernie Meyerson, an IBMIBM
International Business Machines Corporation or IBM is an American multinational technology and consulting corporation headquartered in Armonk, New York, United States. IBM manufactures and sells computer hardware and software, and it offers infrastructure, hosting and consulting services in areas...
fellow.
SiGe is manufactured on silicon wafers using conventional silicon processing
Semiconductor fabrication
Semiconductor device fabrication is the process used to create the integrated circuits that are present in everyday electrical and electronic devices. It is a multiple-step sequence of photolithographic and chemical processing steps during which electronic circuits are gradually created on a wafer...
toolsets. SiGe processes achieve costs similar to those of silicon CMOS manufacturing and are lower than those of other heterojunction technologies such as gallium arsenide. Recently, organogermanium precursors (e.g. isobutylgermane, alkylgermanium trichlorides, and dimethylaminogermanium trichloride) have been examined as less hazardous liquid alternatives to germane for MOVPE deposition of Ge-containing films such as high purity Ge, SiGe, and strained silicon
Strained silicon
Strained silicon is a layer of silicon in which the silicon atoms are stretched beyond their normal interatomic distance. This can be accomplished by putting the layer of silicon over a substrate of silicon germanium...
.
SiGe foundry
Foundry (electronics)
In the microelectronics industry a semiconductor fabrication plant is a factory where devices such as integrated circuits are manufactured....
services are offered by several semiconductor technology companies. AMD disclosed a joint development with IBM for a SiGe stressed-silicon technology, targeting the 65-nm process. TSMC also sells SiGe manufacturing capacity.
SiGe Transistors
SiGe allows CMOS logic to be integrated with heterojunction bipolar transistorHeterojunction bipolar transistor
The heterojunction bipolar transistor is a type of bipolar junction transistor which uses differing semiconductor materials for the emitter and base regions, creating a heterojunction. The HBT improves on the BJT in that it that can handle signals of very high frequencies, up to several hundred...
s, making it suitable for mixed-signal circuits. Heterojunction bipolar transistors have higher forward gain and lower reverse gain than traditional homojunction bipolar transistor
Bipolar junction transistor
|- align = "center"| || PNP|- align = "center"| || NPNA bipolar transistor is a three-terminal electronic device constructed of doped semiconductor material and may be used in amplifying or switching applications. Bipolar transistors are so named because their operation involves both electrons...
s. This translates into better low current and high frequency performance. Being a heterojunction technology with an adjustable band gap
Band gap
In solid state physics, a band gap, also called an energy gap or bandgap, is an energy range in a solid where no electron states can exist. In graphs of the electronic band structure of solids, the band gap generally refers to the energy difference between the top of the valence band and the...
, the SiGe offers the opportunity for more flexible band gap tuning
Bandgap voltage reference
A bandgap voltage reference is a temperature independent voltage reference circuit widely used in integrated circuits, usually with an output voltage around 1.25 V, close to the theoretical 1.22 eV bandgap of silicon at 0 K. This circuit concept was first published by David Hilbiber in 1964...
than silicon-only technology.
Silicon Germanium-on-insulator (SGOI) is a technology analogous to the Silicon-On-Insulator (SOI)
Silicon on insulator
Silicon on insulator technology refers to the use of a layered silicon-insulator-silicon substrate in place of conventional silicon substrates in semiconductor manufacturing, especially microelectronics, to reduce parasitic device capacitance and thereby improving performance...
technology currently employed in computer chips. SGOI increases the speed of the transistor
Transistor
A transistor is a semiconductor device used to amplify and switch electronic signals and power. It is composed of a semiconductor material with at least three terminals for connection to an external circuit. A voltage or current applied to one pair of the transistor's terminals changes the current...
s inside microchips by straining the crystal lattice
Strain engineering
Strain engineering refers to a general strategy employed in semiconductor manufacturing to enhance device performance. Performance benefits are achieved by modulating strain in the transistor channel, which enhances electron mobility and thereby conductivity through the channel.-Strain...
under the MOS transistor
MOSFET
The metal–oxide–semiconductor field-effect transistor is a transistor used for amplifying or switching electronic signals. The basic principle of this kind of transistor was first patented by Julius Edgar Lilienfeld in 1925...
gate, resulting in improved electron mobility
Electron mobility
In solid-state physics, the electron mobility characterizes how quickly an electron can move through a metal or semiconductor, when pulled by an electric field. In semiconductors, there is an analogous quantity for holes, called hole mobility...
and higher drive currents. SiGe MOSFETs can also provide lower junction leakage due to the lower band gap value of SiGe.
External links
- Ge Precursors for Strained Si and Compound Semiconductors; Semiconductor International, April 1, 2006.